Publications Using SuMMIT




 

DX Yang, A Frommhold, A McClelland, J Roth, M Rosamond, EH Linfield, J Osmond, RE Palmer, APG Robinson, Performance of a high resolution chemically amplified electron beam resist at various beam energies, Microelectron Eng 155;97-101:2016

A Frommhold, DX Yang, A McClelland, J Roth, X Xue, MC Rosamund, EH Linfield APG Robinson, Novel Molecular Resist for EUV and Electron Beam Lithography, J Photopolym Sci Technol 28;537-540:2015

A Frommhold, A McClelland, DX Yang, RE Palmer, J Roth, Y Ekinci, MC Rosamund, APG Robinson,Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography, Proc SPIE 9425;942504:2015

A. Frommhold, D.X. Yang, A. McClelland, X. Xue, Y. Ekinci, R.E. Palmer, A.P.G. Robinson, "Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography," Proc SPIE, 9051, 905119 (2014).

A. Frommhold, D.X. Yang, A. McClelland, X. Xue, Y. Ekinci, R.E. Palmer, A.P.G. Robinson, "Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography," J Micro/Nanolithography, MEMS, and MOEMS, 12, 033010 (2013). 

D.X. Yang, A. Frommhold, X. Xue, R.E. Palmer, A.P.G. Robinson, "Chemically Amplified Phenolic Fullerene Electron Beam Resist," J Mater Chem C, 2, 1505-1512 (2014).

Suchit Bhattarai ; Andrew R. Neureuther ; Patrick P. Naulleau, "Simulation analysis of LER and dose tradeoffs for EUV resists with photo-decomposable quenchers,"  Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867925 (April 1, 2013); doi:10.1117/12.2012669

Patrick P. Naulleau1), Christopher N. Anderson1), Suchit Bhattarai2), Andrew Neureuther2), "EUV Extendibility: Challenges Facing EUV at 1x and beyond," Journal of Photopolymer Science and Technology
Vol. 26 (2013) No. 6 p. 697-704

Brian Cardineau1), William Early1), Tomohisa Fujisawa2), Ken Maruyama3), Makato Shimizu2), Shalini Sharma3), Karen Petrillo4), Robert Brainard1), "LER Limitations of Resist Thin Films," Journal of Photopolymer Science and Technology Vol. 25 (2013) No. 5 p. 633-640

Brittany M. McClinton ; Robert J. Chen ; Simi A. George ; Yongbae Kim ; Lorie-Mae Baclea-an ; Patrick P. Naulleau, "50X, 75X mask cleaning effects on EUV lithography process and lifetime: lines and spaces, contacts, and LER," Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83223C (March 29, 2012); doi:10.1117/12.918236

Han-Hao Cheng ; Imelda Keen ; Anguang Yu ; Ya-Mi Chuang ; Idriss Blakey ; Kevin S. Jack ; Michael J. Leeson ; Todd R. Younkin ; Andrew K. Whittaker, "EUVL compatible LER solutions using functional block copolymers," Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231O (March 1, 2012); doi:10.1117/12.916744

Brittany M. McClinton ; Patrick P. Naulleau, "Mask roughness induced LER: geometric model at long correlation lengths," Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691Y (April 07, 2011); doi:10.1117/12.881677

Brittany M. McClinton ; Patrick P. Naulleau, "Mask roughness induced LER control and mitigation: aberrations sensitivity study and alternate illumination scheme," Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691Z (April 07, 2011); doi:10.1117/12.881678

Brittany M. McClinton ; Patrick P. Naulleau ; Thomas Wallow, "Absorber height effects on SWA restrictions and shadow LER," Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796920 (April 07, 2011); doi:10.1117/12.882266

Emily Gallagher ; Gregory McIntyre ; Tom Wallow ; Sudharshanan Raghunathan ; Obert Wood ; Louis Kindt ; John Whang ; Monica Barrett, "EUV masks under exposure: practical considerations," Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690W (April 05, 2011); doi:10.1117/12.880755

Stewart A. Robertson ; John J. Biafore ; Mark D. Smith ; Michael T. Reilly ; Jerome Wandell, "Predictive linewidth roughness and CDU simulation using a calibrated physical stochastic resist model," Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763934 (March 25, 2010); doi:10.1117/12.846539

Brittany M. McClinton ; Patrick P. Naulleau," Mask roughness induced LER: a rule of thumb," Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362G (March 22, 2010); doi:10.1117/12.851226

Simi A. George ; Patrick P. Naulleau ; Ahila Krishnamoorthy ; Zeyu Wu ; Edward W. Rutter, Jr. ; Joseph T. Kennedy ; Song Yuan Xie ; Kyle Y. Flanigan ; Thomas I. Wallow, "Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films," Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763605 (March 17, 2010); doi:10.1117/12.848405

Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Raluca Tiron, Claire Sourd, Philippe Bandelier, Johann Foucher, Hassan Ridaoui, Ali Dirani, Olivier Soppera, Damien Perret, Christophe Brault, Christophe A. Serra, Georges Hadziioannou, “Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances,” Advanced Materials, Volume 21 Issue 10-11, Pages 1121 – 1125

de la Fuente Vornbrock, A., Ding, J.M. ; Sung, D. ; Huai-Yuan Tseng ; Subramanian, Vivek, "Printing and scaling of metallic traces and capacitors using a laboratory-scale rotogravure press," Flexible Electronics & Displays Conference and Exhibition, 2009. 10.1109/FEDC.2009.5069279

 Jau M. Ding, Alejandro de la Fuente Vornbrock, Ching Ting and Vivek Subramanian “Patternable polymer bulk heterojunction photovoltaic cells on plastic by rotogravure printing,” Solar Energy Materials and Solar Cells, Volume 93, Issue 4, April 2009, Pages 459-464
 
Christopher N. Anderson, Patrick P. Naulleau, “Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists,” J. Vac. Sci. Technol. B Volume 27, Issue 2, pp. 665-670 (March 2009)
 
Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi “Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging,” Proc. SPIE, Vol. 7271, 72713U (2009); doi:10.1117/12.814196
 
Toshikage Asakura, Hitoshi Yamamoto, Yuichi Nishimae, Keizo Okada, Masaki Ohwa, “PAG Study in EUV Lithography,” Journal of Photopolymer Science and Technology
Vol. 22 (2009) , No. 1 89-95

Stewart A. Robertson ; John J. Biafore ; Mark D. Smith ; Michael T. Reilly ; Jerome Wandell, "Validation of the predictive power of a calibrated physical stochastic resist model," Proc. SPIE 7520, Lithography Asia 2009, 75201N (December 12, 2009); doi:10.1117/12.836901
  
Drew Forman, "Tuning Photoresists using Star Resists and Combinatorial Techniques", Techcon 2009 Technology and Talent for the 21st Century, Austin, TX, Sept 14, 2009

Jau M. Ding,  Alejandro de la Fuente Vornbrock, Ching Ting, Vivek Subramanian," Patternable polymer bulk heterojunction photovoltaic cells on plastic by rotogravure printing," Solar Energy Materials and Solar Cells
Volume 93, Issue 4, April 2009, Pages 459–464

Patrick P. Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, and Kenneth A. Goldberg, Michael Goldstein, Brian Hoef, Russ Hudyma, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, John Roller, Thomas Wallow, Stefan Wurm, “The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond,” Proc. SPIE, Vol. 7271, 72710W (2009); doi:10.1117/12.814232

Drew Forman, "Tuning Photoresists using Star Resists and Combinatorial Techniques", Cornell NanoScale Facility Annual Meeting, Ithaca, NY, Sept 17, 2009

Bangsaruntip, S., Cohen, G.M. ; Majumdar, A. ; Zhang, Y. ; Engelmann, S.U. ; Fuller, N.C.M. ; Gignac, L.M. ; Mittal, S. ; Newbury, J.S. ; Guillorn, M. ; Barwicz, T. ; Sekaric, L. ; Frank, M.M. ; Sleight, J.W., "High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling," Electron Devices Meeting (IEDM), 2009 IEEE International  10.1109/IEDM.2009.5424364

Gregg M. Gallatin ; Patrick Naulleau ; Dimitra Niakoula ; Robert Brainard ; Elsayed Hassanein ; Richard Matyi ; Jim Thackeray ; Kathleen Spear ; Kim Dean, "Resolution, LER, and sensitivity limitations of photoresists," Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211E (March 20, 2008); doi:10.1117/12.772763

Yasuyuki Fukushima, Takeo Watanabe, Ryuji Ohnishi, Hideaki Shiotani, Shota Suzuki, Masamichi Hayakawa1, Yusuke Endo1, Tomotaka Yamanaka1, Shinichi Yusa2 and Hiroo Kinoshita, "Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist," 2008 Jpn. J. Appl. Phys. 47 6293 doi:10.1143/JJAP.47.6293
Yasuyuki Fukushima, Takeo Watanabe, Ryuji Ohnishi, Hideaki Shiotani, Shota Suzuki, Masamichi Hayakawa, Yusuke Endo, Tomotaka Yamanaka, Shinichi Yusa, Hiroo Kinoshita, “Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist,” Jpn. J. Appl. Phys. 47 (2008) pp. 6293-6296
 
John T. Woodward, Kwang-Woo Choi, Vivek M. Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva,  Nelson M. Felix, Christopher K. Ober, “Characterization of the latent image to developed image in model EUV photoresists,” Proc. SPIE, Vol. 6923, 69232B (2008); doi:10.1117/12.773036

Anuja De Silva, Jin-Kyun Lee, Xavier André, Nelson M. Felix, Heidi B. Cao, Hai Deng, Christopher K. Ober, “Study of the Structure-Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography,” Chem. Mater., 2008, 20 (4), pp 1606–1613
 
D. Y. Kim, H. J. Lee, H. Y. Jung, N.-E. Lee, T. G. Kim, B. H. Kim, Jinho Ahn, C. Y. Kim, “Dry etching of extreme ultraviolet lithography mask structures in inductively coupled plasmas,” J. Vac. Sci. Technol. A Volume 26, Issue 4, pp. 857-860 (July 2008)
 
Manish Chandhok, Kent Frasure, E. Steve Putna, Todd R. Younkin, Willy Rachmady, Uday Shah, and Wang Yueh, “Improvement in linewidth roughness by postprocessing” J. Vac. Sci. Technol. B Volume 26, Issue 6, pp. 2265-2270 (November 2008)
 
Oleg Kritsun, Ivan Lalovic, Slava Rokitski, Bill Partlo, Bruno La Fontaine, “Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle” J. Vac. Sci. Technol. B Volume 26, Issue 6, pp. 2145-2150 (November 2008)

Takeo Watanabe, Hiroo Kinoshita, “Development of EUV Resists in University of Hyogo,” Journal of Photopolymer Science and Technology, Vol. 20 (2007) , No. 3 373-382

Adam R. Pawloski, Glenn McGall, Robert G. Kuimelis, Dale Barone, Andrea Cuppoletti, Paul Ciccolella, Eric Spence, Farhana Afroz, Paul Bury, Christy Chen, Chuan Chen, Dexter Pao, Mary Le, Becky McGee, Elizabeth Harkins, Michael Savage, Sim Narasimhan, Martin Goldberg, Richard Rava, and Stephen P. A. Fodor, “Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities,” J. Vac. Sci. Technol. B Volume 25, Issue 6, pp. 2537-2546 (November 2007)

J. Foucher ; A. Pikon ; C. Andes ; J. Thackeray, "Impact of acid diffusion length on resist LER and LWR measured by CD-AFM and CD-SEM," Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65181Q (April 05, 2007); doi:10.1117/12.712186

P. Zhang ; M. Jaramillo, Jr. ; S. Cassel ; T. Wallow ; A. Acheta ; A. R. Pawloski ; S. Bell ; R. H. Kim," Post-etch LER performance of novel surface conditioner solutions," Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533Y (March 29, 2006); doi:10.1117/12.656648
Ramakrishnan Ayothi, Seung Wook Chang, Nelson Felix, Heiji B. Cao, Hai Deng, Wang Yueh, Christopher K. Ober, “New PFOS Free Photoresist Systems for EUV Lithography,” Journal of Photopolymer Science and Technology, Vol. 19 (2006) , No. 4 515-520
 
Ayothi, Ramakrishnan; Chang, Seung Wook; Felix, Nelson; Cao, Heidi B.; Deng, Hai; Wang, Yueh; Ober, Christopher K., "New PFOS free photoresist systems for EUV lithography," Journal of Photopolymer Science and Technology (2006), 19(4), 515-520.
 
Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton, Da Yang, Nelson Felix, Heidi B. Cao, Hai Deng and Christopher K. Ober, “Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography,” J. Mater. Chem., 2006, 16, 1470 - 1474, DOI: 10.1039/b514065j  
 
Takao Watanabe, Yasuyuki Fukushima, Hideaki Shiotani, Masamichi Hayakawa, Satoshi Ogi, Yusuke Enodo, Tomotaka Yamamoto, Shinichi, Yusa Hiroo Kinoshita, “CA Resist with Side Chain PAG Group for EUV Resist,” Journal of Photopolymer Science and Technology, Vol. 19 (2006) , No. 4 521-524

Adam R. Pawloski, Alden Acheta, Harry J. Levinson, Timothy B. Michaelson, Andrew Jamieson, Yukio Nishimura, C. Grant Willson, “Line edge roughness and intrinsic bias for two methacrylate polymer resist systems,” J. Microlith., Microfab., Microsyst., Vol. 5, 023001 (2006); doi:10.1117/1.2200675
 
Roel Gronheid, Harun H. Solak, Yasin Ekinci, Amandine Jouve, Frieda Van Roey “Characterization of extreme ultraviolet resists with interference lithography,” Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, Pages 1103-1106
 
Linnea Sundström, Leslie Krupp, Eugene Delenia, Charles Rettner, Martha Sanchez, Mark W. Hart, Ho-Cheol Kim, Ying Zhang “Patterning ~20  nm half-pitch lines on silicon using a self-assembled organosilicate etch mask,” Appl. Phys. Lett. 88, 243107 (2006); doi:10.1063/1.2205178

Adam R. Pawloski ; Alden Acheta ; Scott Bell ; Bruno La Fontaine ; Tom Wallow ; Harry J. Levinson," The transfer of photoresist LER through etch," Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615318 (March 29, 2006); doi:10.1117/12.652206

Thomas Koehler ; Robert L. Brainard ; Patrick P. Naulleau ; David Van Steenwinckel ; Jeroen H. Lammers ; Kenneth A. Goldberg ; Joseph F. Mackevich ; Peter Trefonas," Performance of EUV photoresists on the ALS micro exposure tool," Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, 754 (September 14, 2005); doi:10.1117/12.600511

Timothy B. Michaelson ; Adam R. Pawloski ; Alden Acheta ; Yukio Nishimura ; C. Grant Willson," The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness," Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, 368 (September 14, 2005); doi:10.1117/12.599848
  
M. Dusa, B. Arnold, A. Fumar-Pici, “Prospects and initial exploratory results for double exposure/double pitch technique,” Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium, pp. 177- 180, Sept. 2005

Yi, Yi; Ayothi, Ramakrishnan; Wang, Yueh; Li, Mingqi; Barclay, George; Sierra-Alvarez, Reyes; Ober, Christopher K.. "Sulfonium Salts of Alicyclic Group Functionalized Semifluorinated Alkyl Ether Sulfonates As Photoacid Generators," Chemistry of Materials ACS ASAP.

Muthiah Thiyagarajan, Kim Dean, Kenneth E. Consalves, “Improved lithographic performance for EUV resists based on polymers having a photoacid generator (PAG) in the backbone,” Journal of Photopolymer Science and Technology, Vol. 18 (2005) , No. 6 737-741
 
A. M. Goethals, R. Gronheld, L. H. A. Leumissen, F. Van Roey, H. H. Solak1) “EUV Resist Screening: Current Performance and Issues,” Journal of Photopolymer Science and Technology, Vol. 18 (2005) , No. 5 647-654
 
Michael D. Shumway, Patrick Naulleau, Kenneth A. Goldberg, Jeffrey Bokor “Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques,” J. Vac. Sci. Technol. B Volume 23, Issue 6, pp. 2844-2847 (November 2005)
 
Adam R. Pawloski, Bruno La Fontaine, Harry J. Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, “Comparative study of mask architectures for EUV lithography,” Proc. SPIE, Vol. 5567, 762 (2004); doi:10.1117/12.569289

Robert L. Brainard ; Peter Trefonas ; Jeroen H. Lammers ; Charlotte A. Cutler ; Joseph F. Mackevich ; Alexander Trefonas ; Stewart A. Robertson," Shot noise, LER, and quantum efficiency of EUV photoresists," Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 74 (May 20, 2004); doi:10.1117/12.536411

Richard D. Peters ; Colita Parker ; Jonathan Cobb ; Eric Luckowski ; Eric Weisbrod ; Bill Dauksher, "Single-layer and bilayer resist processes for EUV-type integrations," Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, 746 (May 14, 2004); doi:10.1117/12.535643
Charlotte A. Cutler ; Joseph F. Mackevich ; Jieming Li ; Donna J. O'Connell ; Gregory F. Cardinale ; Robert L. Brainard, "Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists," Proc. SPIE 5037, Emerging Lithographic Technologies VII, 406 (June 13, 2003); doi:10.1117/12.482370

Jonathan L. Cobb ; Paul M. Dentinger ; Luke L. Hunter ; Donna J. O'Connell ; Gregg M. Gallatin ; William D. Hinsberg ; Frances A. Houle ; Martha I. Sanchez ; Wolf-Dieter Domke ; Stefan Wurm ; Uzodinma Okoroanyanwu ; Sang Hun Lee, "EUV photoresist performance results from the VNL and the EUV LLC,"  Proc. SPIE 4688, Emerging Lithographic Technologies VI, 412 (July 5, 2002); doi:10.1117/12.472316

Jonathan L. Cobb ; S. Dakshina-Murthy ; Colita Parker ; Eric Luckowski ; Arturo M. Martinez, Jr. ; Richard D. Peters ; Wei Wu ; Scott D. Hector, "Integration of UTR processes into MPU IC manufacturing flows," Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, 277 (July 15, 2002); doi:10.1117/12.474226

Home | Products | Contact | Support


Graphics by Art for the web