SuMMIT is an
interactive off-line analysis package for litho-relevant image data analysis such critical dimension (CD),
line-edge/width roughness (LER/LWR), process window, contact hole,
corner rounding, surface roughness etc. SuMMIT works with a wide
variety of image data including, SEM, TEM, aerial-image microscope, AFM,
modeling ... This feature-rich
analysis program integrates a variety of visualization tools and
numerous built-in processing algorithms into a user-friendly, yet
powerful, GUI with automation capabilities. Introduced in 2004, SuMMIT
is in use througout the lithography industry
and has been referenced in numerous scientific
papers. For more
information on SuMMIT and the available
toolboxes, please refer to our product page.
To see what's new and upgrade your current version to the latest
release please visit our support page.
In addition to metrology image analysis, SuMMIT is your complete LER solution incorporating powerful tools for modeling.
Using the Stochastic Resist Modeling Toolbox, SuMMIT provides fully
resist modeling capabilities. Simply load an aerial image into SuMMIT,
the resist parameteras, and SuMMIT will compute the resulting stochastic
resist and intermediate images and automatically compute the LER.
modeling mask effects? SuMMIT can export measured and/or synthesized
mask absorber data for use in your favorite litho modeling package.
Analyze mask SEM data and export that data for modeling of effects such
as LER transfer function. Also, SuMMIT addresses mask surface/phase
roughness modeling with the Surface Analysis Toolbox that allows
for easy synthesis of mask modeling input given surface data from a
variety of tools including AFM and interferometers. Just take the
ouput mask data and feed it into you litho modeling package.
SuMMIT can be
downloaded through our support page,
however, in order to install and run the program, a license key is
required. Please contact our sales department for a quote and delivery of a license file. Volume
and student pricing available. Time-limited trial licenses are also
available upon request.